EIPBN — The 65th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication​

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as “3-Beams,” is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies; related emerging technologies; and their applications in a broad spectrum of fields. This is the 65th meeting of the EIPBN, where top researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent trends and future directions in these technologies.

Topics: Electron and ion-beam lithography; Advanced micro and nanolithography; Beam shaping design and tools; Nanoimprint lithography; Scanning probes techniques; Atomically precise fabrication; Directed self-assembly; Bioinspired nanostructures; Nano-electronics; Nanofabrication for quantum computing; Nanofabrication for neuromorphic computing; Nanofabrication for energy applications; Micro- and nano- electromechanical systems; Micro- and nano- fluidics; Biomedical devices; Nano-biology and medicine; Nanophotonics and nanoplasmonics; Metamaterials and meta-lenses; Micro/nanoscale additive manufacturing; Nanofabrication for 2D materials and devices; Resists and resist processing; Simulation and modeling for the nanoscale; Cold atom ion and electron sources; Cutting-edge industrial developments