OSHA Process Safety Management (PSM) compliance directive (CPL) and interpretations review

This 90-minute webinar will help you understand the application and requirements of OSHA Process Safety Management and the topics that have been interpreted and reviewed in the compliance guidelines.

Why Should You Attend:

Federal OSHA has published a considerable body of published interpretations as well as compliance guidelines focused on assisting employers in meeting Process Safety Management (29 CFR 1910.119) requirements. 

This presentation will examine the basics of implementing Federal OSHA PSM requirements. In this session, we will review the applicability of PSM and survey priority topics of implementation. Key topics include review of OSHA formal letters of interpretation and how they affect owners and operators of covered processes. The course will also specifically examine the current OSHA PSM compliance directive (CPL-02-02-045) as well as the recent OSHA covered process National Emphasis Program (NEP) compliance directive (CPL-03-00-014).

Learning Objectives:

At the conclusion of the module, participants should be able to:

• Define a process and determine PSM applicability.
• Understand in general terms the PSM regulation.
• Gain familiarity with key PSM implementation topics such as mechanical integrity, standard operating procedures, process safety information, and process hazard analysis.

Areas Covered in the Seminar:

• Federal OSHA Process Safety Management of Highly Hazardous Materials (29CFR1910.119).

Who Will Benefit:

This webinar will provide valuable assistance to:

• Staff working with regulated quantities of highly hazardous materials (covered processes)
• Engineers designing, installing and operating covered processes
• EHS staff seeking increased familiarity with covered process compliance issues
• Managers or Supervisors of covered processes
• American Institute of Chemical Engineers (AIChE)
• American Society of Safety Engineers (ASSE)
• International Institute of Ammonia Refrigeration (IIAR)