SPIE Advanced Lithography + Patterning
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Topic : Engineering and Technology; Microtechnology, Nanotechnology
Mathematics and Statistics; Engineering and Technology; Keywords: Integration, Manufacturing, Technology
Description :
The conference for emerging technology in the semiconductor industry. A conference program has been built with all the great content you expect at SPIE Advanced Lithography + Patterning. Prepare to join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Your colleagues look forward to seeing you in San Jose.
Topics: Optical, EUV, Nanolithography, DTCO, Computational Patterning, Metrology, Inspection, Process Control, Novel Patterning Technologies, Patterning Materials and Processes, Advanced Etch Technology, Process Integration for Nanopatterning,
SPIE organises its event entitled SPIE Advanced Lithography + Patterning to be held from 24 April 2022 to 28 April 2022 in San Jose, California, United States. It covers various areas of Engineering and Technology including Microtechnology, Nanotechnology. For more information, visit the website of the conference or contact the organizer.
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